Nruam Reflective Film Magnetron Sputtering Nqus PVD Txheej Kab yog cov txheej txheem tsim tshwj xeeb, uas feem ntau yog siv los tso ib lossis ntau txheej ntawm cov yeeb yaj kiab uas tsis tshua muaj siab ua haujlwm rau saum npoo ntawm substrates (xws li iav, yas, hlau, ceramic, semiconductor wafer, thiab lwm yam).
Nws cov tub ntxhais yog vaporize los yog ionize cov khoom txheej los ntawm ntau yam kev siv lub cev nyob rau hauv ib qho chaw nqus tsev vacuum, thiab ces condense nws mus rau hauv ib zaj duab xis ntawm lub substrate.
Daim ntawv thov:
Nqus txheej ntawm tooj liab, nyiaj thiab lwm yam ntaub ntawv conductive nyob rau saum npoo ntawm hluav taws xob tivthaiv ceramics thiab Circuit Court board ceramics.
Nws kuj tseem tsim nyog rau lub tshuab nqus tsev ntawm ntau cov hlau zaj duab xis txheej rau saum npoo ntawm lwm cov phaj-zoo li workpieces (iav, acrylic board, thiab lwm yam);
Cov yam ntxwv tseem ceeb:
Sib nqus teb confines plasma
Qhov no yog qhov tseem ceeb ntawm magnetron sputtering. Los ntawm kev siv lub zog sib nqus ntawm cov duab tshwj xeeb (feem ntau yog lub nplhaib lossis cov duab racetrack) nyob ze ntawm lub hom phiaj, cov khoom siv hluav taws xob raug kaw ze ntawm lub hom phiaj ntawm qhov chaw kom ua rau lub voj voog ncig, uas ua rau muaj qhov tshwm sim ntawm kev sib tsoo thiab ionization ntawm electrons nrog cov roj ua haujlwm (feem ntau argon) atoms.
High ionization tus nqi thiab siab deposition tus nqi
Sib nqus teb confinement ho nce plasma ceev thiab ionization tus nqi, ua rau cov txheej txheem sputtering ntau npaum.
Qhov no txhais tau hais tias ntawm qhov tsis tshua muaj roj siab thiab tsis tshua muaj hluav taws xob hluav taws xob / lub zog, ntau dua sputtering thiab deposition tus nqi tuaj yeem ua tiav dua li cov pa DC sputtering.
Tsawg kub txheej txheem
Txij li thaum feem ntau ntawm lub zog yog siv los ionize cov pa roj thiab sputter lub hom phiaj atoms, kuj me ntsis tshav kub yog pauv mus rau lub substrate.
Zoo zaj duab xis zoo
Zoo ceev, muaj zog adhesion, siab purity thiab zoo uniformity.
Ntau yam ntawm cov khoom siv adaptability
Cov txheej txheem tswj tau zoo
Lub magnetron sputtering txheej txheej ntau lawm tau dhau los ua ib qho ntawm cov thev naus laus zis tseem ceeb rau kev npaj cov yeeb yaj kiab ua haujlwm (xws li cov yeeb yaj kiab kho qhov muag, cov yeeb yaj kiab ua yeeb yaj kiab, hnav- cov yeeb yaj kiab tawv tawv, cov yeeb yaj kiab zoo nkauj, tiv thaiv- cov yeeb yaj kiab corrosion, cov yeeb yaj kiab sib nqus, cov yeeb yaj kiab semiconductor, thiab lwm yam) hauv kev lag luam niaj hnub no vim nws cov txiaj ntsig zoo, cov txiaj ntsig zoo thiab cov txiaj ntsig zoo. Cov txheej txheem kub tsis tshua muaj, zoo heev zaj duab xis zoo (compact, muaj zog adhesion), dav khoom adaptability, zoo uniformity thiab controllability. Nws muaj ntau yam kev siv hauv microelectronics, vaj huam sib luag tiaj tus, lub hnub ci hlwb, cov cuab yeej txheej, cov khoom siv tsheb, ntim khoom, kho kom zoo nkauj, kho qhov muag thiab lwm yam.
Cim npe nrov: nruam reflective zaj duab xis magnetron sputtering nqus pvd txheej kab, Tuam Tshoj nruam reflective zaj duab xis magnetron sputtering nqus pvd txheej kab manufacturers, lwm tus neeg, Hoobkas
